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Materials and Processes for Next Generation Lithography (Hardcover)

Materials and Processes for Next Generation Lithography (Hardcover) - image 1 of 1

About this item

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.

This book therefore aims to bring together the worlds foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication.

  • Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation
  • Includes information on processing and metrology techniques
  • Brings together multiple approaches to litho pattern recording from academia and industry in one place
Number of Pages: 425
Genre: Technology
Series Title: Frontiers of Nanoscience
Format: Hardcover
Publisher: Elsevier Science Ltd
Language: English
Street Date: October 6, 2016
TCIN: 51731110
UPC: 9780081003541
Item Number (DPCI): 248-30-2571
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