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Spacer Engineered Finfet Architectures : High-performance Digital Circuit Applications (Hardcover)
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This book focuses towards the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability and reliabilities issues. This book comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations. This book concentrates on last ten years of cutting-edge research on high-permittivity materials and its usage in FinFETs either as gate-dielectric or spacer engineering. It specifically targets spacer engineering, discussing its pros and cons with FinFETs covers complete device to circuit perspective while exploring its variability aspects also.