product description page

Spacer Engineered Finfet Architectures : High-performance Digital Circuit Applications (Hardcover)

Spacer Engineered Finfet Architectures : High-performance Digital Circuit Applications (Hardcover) - image 1 of 1

about this item

This book focuses towards the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability and reliabilities issues. This book comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations. This book concentrates on last ten years of cutting-edge research on high-permittivity materials and its usage in FinFETs either as gate-dielectric or spacer engineering. It specifically targets spacer engineering, discussing its pros and cons with FinFETs covers complete device to circuit perspective while exploring its variability aspects also.

Number of Pages: 216.0
Genre: Technology
Format: Hardcover
Publisher: Taylor & Francis
Author: Sudeb Dasgupta & Brajesh Kumar Kaushik & Pankaj Kumar Pal
Language: English
Street Date: March 10, 2017
TCIN: 51967002
UPC: 9781498783590
Item Number (DPCI): 248-37-5574

guest reviews

Prices, promotions, styles and availability may vary by store & online. See our price match guarantee. See how a store is chosen for you.